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Ann Chiaramonti Debay

Research Interests:

Interfaces in metal alloys and multilayer thin films, metal/oxide heterostructures, transition metal oxide surface science, complex laser-matter interactions, atom probe tomography, in-situ transmission electron microscopy.

Professional Affiliations:

Microscopy Society of America (MSA)
Microanalysis Society (MAS)
International Field Emission Society (IFES)
American Physical Society (APS)
Materials Research Society (MRS)
American Vacuum Society (AVS) 

Awards and Honors:

Distinguished Associate Award for Technical Achievement, National Institute of Standards and Technology (2013)

NIST-ARRA Measurement Science and Engineering Fellowship, University of Colorado Boulder and National Institute of Standards and Technology (2011-2012)

Outstanding Presentation, U.S. Department of Commerce Boulder Laboratories Annual Post-Doctoral Poster Symposium (2010 & 2011)

Top 10 Most Downloaded Articles of 2008, Transmission Electron Microscopy of Multilayer Thin Films, Annual Review of Materials Research (2008)

National Research Council (NRC) Postdoctoral Fellowship, U.S. Naval Research Lab (did not accept) (2005)

Best Oral Presentation, J.E. Hilliard Symposium, Department of Materials Science & Engineering, Northwestern University (2005)

Poster Award Winner, Fall Meeting of the Materials Research Society (2004)

BP Chemicals Graduate Student Award for Excellence in Environmental Molecular Science (2004)

Walter P. Murphy Graduate Fellowship, Northwestern University (2000)

Anvil Award for Outstanding Contributions to the Department of Materials Science and Engineering, University of Michigan (1999)

Foundry Educational Foundation Scholarship (1998)

Best Poster, Undergraduate Summer Institute, Laurence Livermore National Laboratory (1998)

Intel Foundation Women in Science and Engineering Scholarship, University of Michigan (1997-1999)

Clarence A. Siebert Memorial Scholarship, University of Michigan (1998)

James W. Freeman Memorial Scholarship, University of Michigan (1997)

Picture of Ann Debay.


Materials Research Engineer
Applied Chemicals and Materials Division
Nanoscale Reliability Group

Employment History:

2013-Present: Materials Research Engineer. Applied Chemicals & Materials Division, NIST. Boulder, CO

2009-2013: PREP Research Associate and NIST-ARRA Measurement Science & Engineering Fellow (Senior Scientist). University of Colorado Boulder & NIST. Boulder, CO 

2005-2008: Post-Doctoral Research Associate. Interfacial Materials Group, Materials Science Division, Argonne National Laboratory.
Argonne, IL

Industry Experience:
2000: Process Engineer Co-Op. Thin Films/Diffusion Group, Intel Corporation. Ocotillo, AZ  

1999: Process Engineer Intern. DUV Lithography Group, Intel Corporation. Aloha, OR  

1997, 1998: Manufacturing Engineering Intern. General Motors Corporation. Warren, MI  


Ph.D. (2005)
Materials Science & Engineering
Northwestern University, Evanston IL
Advisors: Laurence D. Marks (MS&E) and Peter C. Stair (Chemistry)
Minor: Applied Mathematics
Magna Cum Laude  

B.S.E. (1999)
Materials Science & Engineering
University of Michigan, Ann Arbor MI
Magna Cum Laude


Phone: 303-497-5701
Fax: 303-497-6682