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Ann Chiaramonti Debay

Research Interests:

Surfaces and interfaces in multilayer thin films, metal/oxide heterostructures and interfaces, transition metal oxide surface science, reliability physics in nanomaterials and engineered nanostructures, in-situ transmission electron microscopy.

Professional Affiliations:

Microscopy Society of America (MSA)
American Physical Society (APS)
Materials Research Society (MRS)
American Vacuum Society (AVS) 

Awards and Honors:  

NIST-ARRA Measurement Science and Engineering Fellowship, University of Colorado Boulder and National Institute of Standards and Technology (2011, 2012)

Outstanding Presentation, U.S. Department of Commerce Boulder Laboratories Annual Post-Doctoral Poster Symposium (2010, 2011)

Top 10 Most Downloaded Articles of 2008, Transmission Electron Microscopy of Multilayer Thin Films, Annual Review of Materials Research (2008)

National Research Council (NRC) Postdoctoral Fellowship, U.S. Naval Research Lab (did not accept) (2005)

Best Oral Presentation, J.E. Hilliard Symposium, Department of Materials Science & Engineering, Northwestern University (2005)

Poster Award Winner, Fall Meeting of the Materials Research Society (2004)

BP Chemicals Graduate Student Award for Excellence in Environmental Molecular Science (2004)

Walter P. Murphy Graduate Fellowship, Northwestern University (2000)

Anvil Award for Outstanding Contributions to the Department of Materials Science and Engineering, University of Michigan (1999)

Foundry Educational Foundation Scholarship (1998)

Best Poster, Undergraduate Summer Institute, Laurence Livermore National Laboratory (1998)

Intel Foundation Women in Science and Engineering Scholarship, University of Michigan (1997-1999)

Clarence A. Siebert Memorial Scholarship, University of Michigan (1998)

James W. Freeman Memorial Scholarship, University of Michigan (1997)

Selected Publications:

D.L. Miller, M.W. Keller, J.M. Shaw, A.N. Chiaramonti, and R.R. Keller. Epitaxial (111) Films of Cu, Ni, and CuNi on a-Al2O3 (0001) for Graphene Growth by Chemical Vapor Deposition.
Journal of Applied Physics 112 (2012) 064317.

A. Sanders, P. Blanchard, K. Bertness, M. Brubaker, C. Dodson, T. Harvey, A. Herrero, D. Rourke, J. Schlager, N. Sanford, A.N. Chiaramonti, A. Davydov, A. Motayed, and D. Tsvetkov. Homoepitaxial N-Core: P-Shell Gallium Nitride Nanowires: HVPE Overgrowth on MBE Nanowires.
Nanotechnology
22 (2011) 465703.

Y. Liu, A.N. Chiaramonti, D.K. Schreiber, H-S. Yang, S.S.P. Parkin, O.G. Heinonen, and A.K. Petford-Long. Effect of Annealing and Applied Bias on Barrier Shape in CoFe/MgO/CoFe Tunnel Junctions.
Physical Review B
83 (2011) 165413.

M.C. Strus, A.N. Chiaramonti, Y-L. Kim, Y.J. Jung, and R.R. Keller. Accelerated Reliability Testing of Highly Aligned Single-Walled Carbon Nanotube Networks Subjected to DC Electrical Stressing.
Nanotechnology 22 (2011) 265713.

D.K. Schreiber, Y-S Choi, Yuzi Liu, A.N. Chiaramonti, D.N. Seidman, A.K. Petford-Long. Enhanced Magnetoresistance in Naturally-Oxidized MgO-Based Magnetic Tunnel Junctions with Ferromagnetic CoFe/CoFeB Bilayers.
Applied Physics Letters
98 (2011) 232506.

D.K. Schreiber, Y-S. Choi, Y. Liu, A.N. Chiaramonti, D.N. Seidman, and A.K. Petford-Long. Effects of Elemental Distributions on the Behavior of MgO-Based Magnetic Tunnel Junctions.
Journal of Applied Physics
109 (2011) 103909.

C.H. Lanier, A.N. Chiaramonti, L.D. Marks, and K.R. Poeppelmeier. The Fe3O4 origin of the "Biphase" reconstruction on ?-Fe2O3(0001).
Surface Science
603 (2009) 2574-2579.

L.D. Marks, A.N. Chiaramonti, F. Tran, and P. Blaha. The Small Unit Cell Reconstructions of SrTiO3(111).
Surface Science 603 (2009) 2179-2187.

A.N. Chiaramonti, D.K. Schreiber, W.F. Egelhoff, D.N. Seidman, and A.K. Petford-Long. Effect of annealing on local composition and electrical transport correlations in MgO-based magnetic tunnel junctions.
Applied Physics Letters 93 (2008) 103113.

A.N. Chiaramonti
, L.J. Thompson, W.F. Egelhoff, B.C. Kabius, and A.K. Petford-Long. In-Situ TEM Studies of Local Transport and Structure in Nanoscale Multilayer Films.
Ultramicroscopy 108 (2008) 1529-1535.

A.N. Chiaramonti
, C.H. Lanier, P.C. Stair, and L.D. Marks. SrTiO3(111) Surface Reconstructions Following Ar+ Ion Bombardment and Annealing Treatment in Oxygen-Rich Environments.
Surface Science 602 (2008) 3018-3025.

A.K. Petford-Long and A.N. Chiaramonti. Transmission Electron Microscopy of Multilayer Thin Films.
Annual Review of Materials Research 38 (2008) 559-584.

A.N. Chiaramonti
, P.C. Stair, and L.D. Marks. Impurity Stabilized Near-Surface Phase on Ion Bombarded ?-Fe2O3(0001).
Surface Science 586 (2005) 38-44.

A.N. Chiaramonti
and L.D. Marks. Atomic Resolution TEM Imaging of Surfaces.
Journal of Materials Research 20 (2005) 1619-1768.

M.A. Greene, A.N. Chiaramonti, S.T. Christensen, L.X. Cao, M.J. Bedzyk, and M.C. Hersam. Controlled Nanoscale Morphology of Hematite (0001) Surfaces Grown by Chemical Vapor Transport.
Advanced Materials 17 (2004) 1765-1768.

A.N. Chiaramonti
, J.D. Pless, L. Liu, J. Smit, C.H. Lanier, K.R. Poeppelmeier, P.C. Stair, and L.D. Marks. Growth of Single Crystal ?-Fe2O3 from a CaFe4O7-based Solvent.
Journal of Crystal Growth and Design 4 (2004) 749-753.

Picture of Ann Debay.

Position:

Materials Scientist
Materials Reliability Division
Nanoscale Reliability Group

Employment History:

2011-Present: NIST-ARRA Measurement Science and Engineering Fellow. University of Colorado Boulder Senior Research Associate & NIST Affiliate. Boulder, CO

2009-2011: PREP Post-Doctoral Fellow. University of Colorado Boulder Research Associate & NIST Affiliate. Boulder, CO 

2005-2008: Post-Doctoral Research Associate. Interfacial Materials Group, Materials Science Division, Argonne National Laboratory. Argonne, IL  

2000-2005: Graduate Research Associate. Department of Materials Science & Engineering, Northwestern University. Evanston, IL  

2000: Process Engineer Co-Op. Thin Films/Diffusion Group, Intel Corporation. Ocotillo, AZ  

1999: Process Engineer Intern. DUV Lithography Group, Intel Corporation. Aloha, OR  

1997, 1998: Manufacturing Engineering Intern. General Motors Corporation. Warren, MI  

1997-1999: Undergraduate Research Associate. Department of Materials Science & Engineering, University of Michigan. Ann Arbor, MI

Education:

Ph.D. (2005)
Materials Science & Engineering
Northwestern University, Evanston IL
Advisors: Laurence D. Marks (MS&E) and Peter C. Stair (Chemistry)
Minor: Applied Mathematics
Magna Cum Laude  

B.S.E. (1999)
Materials Science & Engineering
University of Michigan, Ann Arbor MI
Magna Cum Laude

Contact

Phone: 303-497-5701
Email: chiaramonti@nist.gov
Fax: 303-497-5030