Manufacturing Process Metrology Group

Welcome

The Manufacturing Process Metrology (MPM) Group is one of the four groups within the Manufacturing Metrology Division (MMD) of the Manufacturing Engineering Laboratory (MEL).  The MPM group provides research, development, and services in two areas:

  • Measurement methods that improve scientific understanding and control of precision manufacturing processes, enabling cost-effective manufacture of complex products with demanding specifications.  The group specializes in the measurement of phenomena during machining that affect part quality and manufacturing efficiency.  Examples of phenomena of interest are part geometry, surface quality, vibrations, cutting forces, temperatures, material flow, material transformations, tool wear, and chip morphology.  The group has unique facilities for measuring material flow and temperature distribution during orthogonal cutting processes and for measuring the properties of materials under manufacturing conditions.  Results are used by industry and academia to improve planning, tooling, and control of challenging manufacturing processes.

  • Measurement methods for optical figure and wavefront that enable innovations in the application and manufacture of advanced optical elements and ultra-precision surfaces.  The primary goal of the research is the development and characterization of interferometric measurement methods.  The group provides calibration services (NIST special tests) for flatness, sphericity, and radius of curvature of optical (reference) surfaces.  The group develops and analyzes generic methods to address the challenge of measuring the shape of aspheric optical surfaces.  Another area of research is the development of methods to measure the performance of nanostructured (diffractive) optical components and their application to challenging measurement problems of conventional (optical) surfaces.  The group also provides measurement methods and reference artifacts that address future requirements of the semiconductor industry in the areas of silicon wafer flatness and extreme ultraviolet lithography (EUVL) optics.


The group supports development of national and international standards in the areas of machine tools (ASME B5 and ISO TC39) and optical testing (ANSI/OEOSC TAG to ISO/TC172).

Programs/Projects
Comparison and Uncertainty Evaluation of Methods for Asphere Metrology — The goal of this project is a rigorous uncertainty assessment of generic methods for measuring aspheres. The evaluated methods include zonal and annular stitching, local curvature measurement, and …
 
Fundamental Metrology for Material Processing — This project will develop the advanced process metrology methods and tools to increase scientific understanding of existing, as well as new and emerging discrete part manufacturing processes. …
 
Investigation of Measurements and Standards Needs for Metal-based Additive Processes — This project will investigate the fundamental characteristics of the metal-based additive processes, identify critical measurement and standards issues, and develop metrology tools to improve the …
 
Measurement Methods and Services for Optical Reference Surfaces — Interferometry is the leading method for measuring ultra-precision surfaces and optical elements. The accuracy of the measurement results is to a large extent determined by the errors in the shape …
 
Measuring Aspheric Optics using Binary Holograms — Aspheric surfaces are indispensable in high-performance optical systems. The ability to accurately manufacture these surfaces to the required shape depends on the ability to measure them. In this …
 
Measuring the Height Transfer Function of Phase-Shifting Interferometers — There is an increasing need for accurate measurements of precision surfaces and optical elements over a wide range of spatial frequencies. Ripple in an optical surface, for example, can decrease …
 
Metrology for Advanced Optics — From herding light into fiber optic cables to projecting computer chip designs onto silicon wafers to the newest medical microscope, mirrors and lenses are crucial to modern technology. But the …
 
Nano-Structured Optics for Measuring Spherical Surfaces with Large Radii — The goal of this project is to solve the problem of measuring the form error and radius of spherical optical surfaces with large radius of curvature through the innovative application of …
 
Wafer Flatness and Wafer Thickness Variation — The semiconductor industry expects continued demand for improved wafer flatness at the exposure site to avoid blurring of ever smaller circuit features due to out-of-focus exposures. This is a …
 
 
Patterned test mirror, shown before final coating, that was fabricated at NIST to evaluate the spatial height transfer function of phase-shifting interferometers.
Patterned test mirror, shown before final coating, that was fabricated at NIST to evaluate the spatial height transfer function of phase-shifting interferometers.   


 
High-speed microvideography analysis of cutting titanium at industrially relevant conditions.
High-speed microvideography analysis of cutting titanium at industrially relevant conditions.
Contact

Johannens Soons, Group Leader
Jennifer Zanoni, Group Secretary

General Information:
301 975 6474 Telephone
301 975 8058 Facsimile

100 Bureau Drive, M/S 8220
Gaithersburg, MD 20899-8220