Publication Citation
NIST Authors in Bold
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| Author(s): | Joseph J. Kopanski; Jay F. Marchiando; J R. Lowney; |
|---|---|
| Title: | Scanning Capacitance Microscopy Measurements and Modeling: Progress Towards Dopant Profiling of Silicon |
| Published: | December 31, 1995 |
| Abstract: | |
| Proceedings: | Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors |
| Pages: | pp. 9.1 - 9.8 |
| Location: | Research Triangle Park, NC |
| Dates: | March 20-22, 1995 |
| Research Areas: |