Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Scanning Ion Microscopy with Low Energy Lithium Ions

NIST Authors in Bold

Author(s): Kevin A. Twedt; Lei Chen; Jabez J. McClelland;
Title: Scanning Ion Microscopy with Low Energy Lithium Ions
Published: July 01, 2014
Abstract: Using an ion source based on photoionization of laser-cooled lithium atoms, we have developed a scanning ion microscope with probe sizes of a few tens of nanometers and beam energies from 500 eV to 5 keV. These beam energies are much lower than the typical operating energies of the helium ion microscope or gallium focused ion beam systems. We demonstrate how low energy can be advantageous in ion microscopy when detecting backscattered ions, due to a decreased interaction volume and the potential for surface sensitive composition analysis. As an example application that demonstrates these advantages, we non-destructively image the removal of a thin residual resist layer during plasma etching in a nano-imprint lithography process.
Citation: Ultramicroscopy
Volume: 142
Pages: pp. 24 - 31
Keywords: Scanning microscopy, Ion scattering, Laser cooling, Nanoimprint lithography
Research Areas: Nanoimprint lithography, Laser Cooling, Focused ion beam imaging (FIB)
DOI: http://dx.doi.org/http://dx.doi.org/10.1016/j.ultramic.2014  (Note: May link to a non-U.S. Government webpage)
PDF version: PDF Document Click here to retrieve PDF version of paper (641KB)