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|Author(s):||Bryan M. Barnes; Jing Qin; Hui Zhou; Richard M. Silver;|
|Title:||Quantitative microscope characterization for parametric measurements with sub-nm parametric uncertainties|
|Published:||September 23, 2013|
|Abstract:||Recently, a new technique called Fourier normalization has enabled the parametric fitting of optical images with multiple or even a continuum of spatial frequencies. Integral to the performance of this methodology is the characterization of the high magnification imaging microscope used in these experiments. Scatterfield microscopy techniques yield the necessary angular resolution required for determining the effects of the illumination and collection paths upon the electric field within the microscope. A multi-step characterization methodology is presented with experimental examples using a microscope operating at (lambda) = 450 nm. A prior scatterfield characterization technique for planar reflectors is reviewed and shown to be a special case of the newer generalized approach. Possible implications of this methodology for improved critical dimension measurements are assessed.|
|Conference:||SPIE Optics & Photonics 2013|
|Proceedings:||Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII|
|Location:||San Diego, CA|
|Dates:||August 25-29, 2013|
|Keywords:||scatterfield microscopy, tool characterization, critical dimension metrology, parametric fitting|
|Research Areas:||Critical Dimension and Overlay Metrology, Optical microscopy|
|DOI:||http://dx.doi.org/10.1117/12.2027259 (Note: May link to a non-U.S. Government webpage)|
|PDF version:||Click here to retrieve PDF version of paper (721KB)|