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Publication Citation: Quantitative microscope characterization for parametric measurements with sub-nm parametric uncertainties

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Author(s): Bryan M. Barnes; Jing Qin; Hui H. Zhou; Richard M. Silver;
Title: Quantitative microscope characterization for parametric measurements with sub-nm parametric uncertainties
Published: September 23, 2013
Abstract: Recently, a new technique called Fourier normalization has enabled the parametric fitting of optical images with multiple or even a continuum of spatial frequencies. Integral to the performance of this methodology is the characterization of the high magnification imaging microscope used in these experiments. Scatterfield microscopy techniques yield the necessary angular resolution required for determining the effects of the illumination and collection paths upon the electric field within the microscope. A multi-step characterization methodology is presented with experimental examples using a microscope operating at (lambda) = 450 nm. A prior scatterfield characterization technique for planar reflectors is reviewed and shown to be a special case of the newer generalized approach. Possible implications of this methodology for improved critical dimension measurements are assessed.
Conference: SPIE Optics & Photonics 2013
Proceedings: Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII
Volume: 8819
Pages: 7 pp.
Location: San Diego, CA
Dates: August 25-29, 2013
Keywords: scatterfield microscopy; tool characterization; critical dimension metrology; parametric fitting
Research Areas: Critical Dimension and Overlay Metrology, Optical microscopy
DOI: http://dx.doi.org/10.1117/12.2027259  (Note: May link to a non-U.S. Government webpage)
PDF version: PDF Document Click here to retrieve PDF version of paper (721KB)