| Author(s): |
Jing Qin; Hui Zhou; Bryan M. Barnes; Francois R. Goasmat; Ronald G. Dixson; Richard M. Silver; |
| Title: |
Multiple-order Imaging for Optical Critical Dimension Metrology using Microscope Characterization |
| Published: |
October 11, 2012 |
| Abstract: |
There has been much recent work in developing advanced optical metrology applications that use imaging optics for optical critical dimension (OCD) measurements, defect detection, and for potential use with in-die metrology applications. We have previously reported quantitative measurements for sub-50 nm CD dense arrays which scatter only the 0th-order specular diffraction component using angle-resolved scatterfield microscopy. Through angle-resolved and focus-resolved imaging, we now access the three-dimensional scattered fields from OCD targets that contain multiple Fourier frequencies. Experimental sensitivity to nanometer scale linewidth changes is presented, supported by simulation studies. A new, more advanced approach to tool normalization is coupled with rigorous electromagnetic simulations and library based regression fitting that potentially enables OCD measurements with sub-nanometer uncertainties for targets that scatter multiple Fourier frequencies. |
| Conference: |
SPIE Optics & Photonics 2012 |
| Proceedings: |
Instrumentation, Metrology, and Standards for Nanomanufacturing IV, Proceedings of SPIE Volume: 7767 |
| Volume: |
8466 |
| Pages: |
12 pp. |
| Location: |
San Diego, CA |
| Dates: |
August 12-17, 2012 |
| Keywords: |
optical metrology; electromagnetic simulation; frequency domain tool normalization; multiple frequency scattering; evaluate sensitivities and uncertainties; phase sensitive measurements; |
| Research Areas: |
Critical Dimension and Overlay Metrology, Optical Metrology |
| DOI: |
10.1117/12.946120 (Note: May link to a non-U.S. Government webpage) |
