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|Author(s):||Andrew J. Allen; Lyle E. Levine; Fan Zhang; Gabrielle G. Long; Jan Ilavsky; Pete R. Jemian;|
|Title:||High-energy Ultra-Small Angle X-ray Scattering Instrument at the Advanced Photon Source|
|Published:||December 01, 2012|
|Abstract:||This paper reports recent tests performed on the Bonse-Hart-type ultra-small angle X-ray scattering (USAXS) instrument at the Advanced Photon Source with higher-order reflection optics , Si (440) instead of Si (220) , and with X-ray energies greater than 21.0 keV. Our results demonstrate the feasibility of high-energy operation with narrower crystal reflectivity curves, which provides access to a scattering vector range from ≈ 2 × 10-5 to 1.8 Å-1 and up to 12 decades in the associated sample dependent scattering intensity range. The corresponding size range of the scattering features spans about 5 decades ‹ from less than 1 Å to ≈ 30 μm. These tests have indicated that mechanical upgrades are required to ensure the alignment capability and operational stability of this instrument for general user operations due to the tighter angular-resolution constraints of the higher-order crystal optics. These upgrades are now underway.|
|Citation:||Journal of Applied Crystallography|
|Pages:||pp. 1318 - 1320|
|Keywords:||Bonse-Hart ultra-small-angle X-ray scattering instrument, USAXS, Ultra-high SAXS resolution|
|Research Areas:||Synchrotron Methods, Structures, Nanomaterials, Materials Science|
|PDF version:||Click here to retrieve PDF version of paper (448KB)|