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Publication Citation: Phase sensitive parametric optical metrology: Exploring the limits of 3-dimensional optical metrology

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Author(s): Richard M. Silver; Jing Qin; Bryan M. Barnes; Hui H. Zhou; Ronald G. Dixson; Francois R. Goasmat;
Title: Phase sensitive parametric optical metrology: Exploring the limits of 3-dimensional optical metrology
Published: April 04, 2012
Abstract: There has been much recent work in developing advanced optical metrology applications that use imaging optics for critical dimension measurements, defect detection and for potential use with in-die metrology applications. Sensitivity to nanometer scale changes has been observed when measuring critical dimensions of sub-wavelength features or when imaging defects below 20 nm using angle-resolved and focus-resolved optical data. However, these methods inherently involve complex imaging optics and analysis of complicated three-dimensional electromagnetic fields. This paper will develop a new approach to enable the rigorous analysis of three-dimensional through-focus optical images. We use rigorous electromagnetic simulation tools and statistical methods to evaluate sensitivities and uncertainties in the measurement of three dimensional layouts encountered in critical dimension, contour metrology and defect inspection.
Conference: Metrology, Inspection, and Process Control for Microlithography
Proceedings: Proceedings of the SPIE
Volume: 8324
Pages: 12 pp.
Location: San Jose, CA
Dates: February 12-16, 2012
Keywords: optical metrology; electromagnetic simulation; evaluate sensitivities and uncertainties; phase sensitive measurements; through-focus three-dimensional field
Research Areas: Optics, Optical microscopy, Critical Dimension and Overlay Metrology, Optical Scattering
PDF version: PDF Document Click here to retrieve PDF version of paper (2MB)