NIST Authors in Bold
| Author(s): | Paul N. Patrone; Russel Caflisch; Dionisios Margetis; |
|---|---|
| Title: | Characterizing Equilibrium in Epitaxial Growth |
| Published: | February 20, 2012 |
| Abstract: | Using a kinetic model of epitaxial growth, we describe how geometry controls kinetic pathways through which external deposition influences the state of a vicinal surface. The state of the surface is determined by three key, adjustable parameters: the local step angle, Peclet number P, and single bond detachment rate b. By scaling arguments in P, we find three steady state regimes: In one regime, detailed balance approximately holds, so that the system is near equilibrium. In the other two regimes, geometric e ffects compete with deposition as the system is driven progressively out of equilibrium. Our analytical results are in excellent agreement with those of kinetic Monte Carlo simulations. |
| Citation: | Europhysics Letters |
| Volume: | 97 |
| Issue: | 4 |
| Keywords: | Kinetic Steady state; detailed balance; epitaxial growth; geometric control |
| Research Areas: | Nanotechnology, Deposition, Nanophysics |
| PDF version: | Click here to retrieve PDF version of paper (222KB) |