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|Author(s):||Vivek M. Prabhu; Shuhui Kang; Regis J. Kline; Dean M. DeLongchamp; Daniel A. Fischer; Wen-Li Wu; Sushil K. Satija; Jing Sha; Christopher K. Ober; Peter V. Bonnesen;|
|Title:||Characterization of the non-uniform reaction in chemically-amplified calixresorcinarene molecular resist thin films|
|Published:||July 19, 2011|
|Abstract:||The ccc stereoisomer-purified tert-butoxycarbonyloxy (t-Boc) protected calixresorcinarene molecular resists blended with photoacid generator exhibit a non-uniform photoacid catalyzed reaction in thin films. The surface displays a reduced reaction extent, compared to the bulk, with average surface-layer thickness (7.0 ± 1.8) nm determined by neutron reflectivity with deuterium-labeled t-Boc groups. Ambient impurities (amines and organic bases) are known to quench surface reactions and contribute, but grazing incidence X-ray diffraction shows an additional effect that the protected molecular resist at the surface was oriented and ordered, while the bulk of the film displayed diffuse scattering representative of amorphous packing. The surface deprotection reaction and presence of photoacid was quantified by near-edge X-ray absorption fine structure measurements.|
|Citation:||Australian Journal of Chemistry|
|Keywords:||molecular resist, neutron reflectivity, line-edge roughness,grazing-incidence X-ray diffraction, near-edge X-ray absorption fine structure|
|Research Areas:||Polymers, Nanofabrication, Nanomanufacturing, and Nanoprocessing, Materials Chemistry and Crystallography, Soft Condensed Matter|
|PDF version:||Click here to retrieve PDF version of paper (801KB)|