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Publication Citation: Characterization of the non-uniform reaction in chemically-amplified calix[4]resorcinarene molecular resist thin films

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Author(s): Vivek M. Prabhu; Shuhui Kang; Regis J. Kline; Dean M. DeLongchamp; Daniel A. Fischer; Wen-Li Wu; Sushil K. Satija; Jing Sha; Christopher K. Ober; Peter V. Bonnesen;
Title: Characterization of the non-uniform reaction in chemically-amplified calix[4]resorcinarene molecular resist thin films
Published: July 19, 2011
Abstract: The ccc stereoisomer-purified tert-butoxycarbonyloxy (t-Boc) protected calix[4]resorcinarene molecular resists blended with photoacid generator exhibit a non-uniform photoacid catalyzed reaction in thin films. The surface displays a reduced reaction extent, compared to the bulk, with average surface-layer thickness (7.0 ± 1.8) nm determined by neutron reflectivity with deuterium-labeled t-Boc groups. Ambient impurities (amines and organic bases) are known to quench surface reactions and contribute, but grazing incidence X-ray diffraction shows an additional effect that the protected molecular resist at the surface was oriented and ordered, while the bulk of the film displayed diffuse scattering representative of amorphous packing. The surface deprotection reaction and presence of photoacid was quantified by near-edge X-ray absorption fine structure measurements.
Citation: Australian Journal of Chemistry
Keywords: molecular resist; neutron reflectivity; line-edge roughness;grazing-incidence X-ray diffraction, near-edge X-ray absorption fine structure
Research Areas: Polymers, Nanofabrication, Nanomanufacturing, and Nanoprocessing, Materials Chemistry and Crystallography, Soft Condensed Matter
PDF version: PDF Document Click here to retrieve PDF version of paper (801KB)