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|Author(s):||Ravikiran Attota; Ronald G. Dixson;|
|Title:||Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes|
|Published:||July 29, 2014|
|Abstract:||We experimentally demonstrate that the three-dimensional (3-D) shape variations of nanometer-scale objects can be resolved and measured with sub-nanometer scale sensitivity using conventional optical microscopes by analyzing 3-D optical data using the through-focus scanning optical microscopy (TSOM) method. These initial results show that TSOM-determined cross-sectional (3-D) shape differences of 30 nm to 40 nm wide lines agree well with critical-dimension atomic force microscope measurements. The TSOM method showed a linewidth uncertainty of 1.22 nm (k=2). Complex optical simulations are not needed for analysis using the TSOM method, making the process simple, economical, fast and ideally suited for high volume nanomanufacturing process monitoring.|
|Citation:||Applied Physics Letters|
|Keywords:||TSOM, nanometrology, three-dimensional metrology, through-focus scanning, nanomanufacturing, nanotechnology, MEMS, NEMS, defect analysis, process control|
|Research Areas:||Optical Metrology, Instrumentation, Nanobiotechnology, Optical microscopy, Characterization, Nanometrology, and Nanoscale Measurements|
|DOI:||http://dx.doi.org/10.1063/1.4891676 (Note: May link to a non-U.S. Government webpage)|