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Publication Citation: Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes

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Author(s): Ravikiran (. Attota; Ronald G. Dixson;
Title: Resolving three-dimensional shape of sub-50 nm wide lines with nanometer-scale sensitivity using conventional optical microscopes
Published: July 29, 2014
Abstract: We experimentally demonstrate that the three-dimensional (3-D) shape variations of nanometer-scale objects can be resolved and measured with sub-nanometer scale sensitivity using conventional optical microscopes by analyzing 3-D optical data using the through-focus scanning optical microscopy (TSOM) method. These initial results show that TSOM-determined cross-sectional (3-D) shape differences of 30 nm to 40 nm wide lines agree well with critical-dimension atomic force microscope measurements. The TSOM method showed a linewidth uncertainty of 1.22 nm (k=2). Complex optical simulations are not needed for analysis using the TSOM method, making the process simple, economical, fast and ideally suited for high volume nanomanufacturing process monitoring.
Citation: Applied Physics Letters
Volume: 105
Keywords: TSOM; nanometrology; three-dimensional metrology; through-focus scanning; nanomanufacturing; nanotechnology; MEMS; NEMS; defect analysis; process control;
Research Areas: Optical Metrology, Instrumentation, Nanobiotechnology, Optical microscopy, Characterization, Nanometrology, and Nanoscale Measurements
DOI: http://dx.doi.org/10.1063/1.4891676  (Note: May link to a non-U.S. Government webpage)