| Author(s): |
Kathryn L. Beers; Michael J. Fasolka; Julie N. Albert; Timothy D. Bogart; Ronald L. Lewis; J. Brian Hutchison; Bryan D. Vogt; Thomas H. Epps; |
| Title: |
Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device |
| Published: |
February 09, 2011 |
| Abstract: |
Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using the device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena. |
| Citation: |
Nano Letters |
| Volume: |
11 |
| Issue: |
3 |
| Pages: |
pp. 1351 - 1357 |
| Keywords: |
gradients, solvent vapor annealing, block copolymer, thin film, self-assembly, microfluidic, mixing tree, nanostructure |
| Research Areas: |
Nanomaterials, Polymers |
| DOI: |
10.1021/nl104496r (Note: May link to a non-U.S. Government webpage) |
| PDF version: |
 Click here to retrieve PDF version of paper (5MB) |
