NIST logo

Publication Citation: Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device

NIST Authors in Bold

Author(s): Kathryn L. Beers; Michael J. Fasolka; Julie N. Albert; Timothy D. Bogart; Ronald L. Lewis; J. Brian Hutchison; Bryan D. Vogt; Thomas H. Epps;
Title: Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device
Published: February 09, 2011
Abstract: Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using the device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.
Citation: Nano Letters
Volume: 11
Issue: 3
Pages: pp. 1351 - 1357
Keywords: gradients, solvent vapor annealing, block copolymer, thin film, self-assembly, microfluidic, mixing tree, nanostructure
Research Areas: Nanomaterials, Polymers
DOI: http://dx.doi.org/10.1021/nl104496r  (Note: May link to a non-U.S. Government webpage)
PDF version: PDF Document Click here to retrieve PDF version of paper (5MB)