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|Author(s):||Kathryn L. Beers; Michael J. Fasolka; Julie N. Albert; Timothy D. Bogart; Ronald L. Lewis; J. Brian Hutchison; Bryan D. Vogt; Thomas H. Epps;|
|Title:||Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device|
|Published:||February 09, 2011|
|Abstract:||Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using the device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.|
|Pages:||pp. 1351 - 1357|
|Keywords:||gradients, solvent vapor annealing, block copolymer, thin film, self-assembly, microfluidic, mixing tree, nanostructure|
|Research Areas:||Polymers, Nanomaterials|
|DOI:||http://dx.doi.org/10.1021/nl104496r (Note: May link to a non-U.S. Government webpage)|
|PDF version:||Click here to retrieve PDF version of paper (5MB)|