Time-resolved Fourier Transform Infrared Spectroscopy of the Gas-phase During Atomic Layer Deposition

Published

June 24, 2010

Author(s)

Brent A. Sperling, William A. Kimes, James E. Maslar, Pamela M. Chu

Abstract

In this work, we develop a Fourier transform infrared spectroscopy-based method to measure the gas-phase dynamics occurring during atomic layer deposition of hafnium oxide using tetrakis (ethylmethylamido) hafnium and water vapor. We take advantage of the repeatability of the deposition process to signal average across multiple cycles. This approach required synchronizing the precursor injection pulses with the moving mirror of the spectrometer. The system as implemented in this work yields spectra with a time resolution of = 150 milliseconds, but better resolution can be easily obtained. Using this technique, we are able to optically measure transients in precursor and product concentrations that are the effects of mass transport and surface reactions.

Citation

Journal of Vacuum Science and Technology A

Volume

28

Issue

4

Pub Type

Journals

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DOI Link

Keywords

atomic layer deposition, Fourier transform infrared spectroscopy, in situ diagnostics

Citation

Sperling, B. , Kimes, W. , Maslar, J. and Chu, P. (2010), Time-resolved Fourier Transform Infrared Spectroscopy of the Gas-phase During Atomic Layer Deposition, Journal of Vacuum Science and Technology A, [online], https://doi.org/10.1116/1.3455187 (Accessed April 25, 2024)