| Author(s): |
Fan Zhang; Kin P. Cheung; Jason P. Campbell; John S. Suehle; |
| Title: |
Frequency-Dependent Charge-Pumping: The Depth Question Revisited |
| Published: |
May 01, 2010 |
| Abstract: |
A popular defect depth-profiling technique, frequency-dependent charge-pumping is carefully re-examined. Without complicated math of modeling, the physics behind the technique is examined clearly. It is shown that there is no unique relationship between the measurement frequency and the probed depth. The conclusion is that frequency-dependent charge-pumping is not a defect depth-profiling technique. |
| Proceedings: |
IEEE International Reliability Physics Symposium Proceedings |
| Pages: |
3 pp. |
| Location: |
Anaheim, CA |
| Dates: |
May 2-6, 2010 |
| Keywords: |
frequency-dependent; charge-pumping; defect; depth profiling |
| Research Areas: |
Electron Physics |
| PDF version: |
 Click here to retrieve PDF version of paper (224KB) |
