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Publication Citation: Polymer Photochemistry at the EUV Wavelength

NIST Authors in Bold

Author(s): Charles S. Tarrio; Theodore Fedynyshyn; Russell Goodman; Alberto Cabral; Thomas B. Lucatorto;
Title: Polymer Photochemistry at the EUV Wavelength
Published: June 08, 2010
Conference: Advances in Resist Materials and Processing Technology XXVII
Proceedings: Proc. SPIE, vol. 7639
Location: San Jose, CA
Dates: January 17-21, 2010
Keywords: EUV lithography, photoresist, polymer chemistry
Research Areas: Physics, Optical Physics
DOI: http://dx.doi.org/10.1117/12.845997  (Note: May link to a non-U.S. Government webpage)
PDF version: PDF Document Click here to retrieve PDF version of paper (494KB)