| Author(s): |
Ravi Kummamuru; Lito De La Rama; Liang Hu; Mark D. Vaudin; Mikhail Efremov; Martin L. Green; David A. LaVan; Leslie Allen; |
| Title: |
Measurement of heat capacity and enthalpy of formation of Nickel Silicide using Nano-calorimetry |
| Published: |
November 02, 2009 |
| Abstract: |
We present characterization of energetics of the reaction between nickel and silicon thin films using differential scanning nano-calorimetry (nano-DSC). For the first time, nano-DSC measurements up to 850 °C and of enthalpy of thin film reactions have been performed. A large exothermic dip in heat capacity attributed to nickel silicide formation is found along with indications of two phase changes at 430 °C and 550 °C. Heating rate reaches 10^6 K/s during the reaction. The total enthalpy of reaction and heat capacity at various stages of the experiment were quantitatively measured. The post-reaction phases were identified using electron backscattered diffraction (EBSD). Samples with 17 nm Ni and 25 nm Si films deposited (Ni/Si molar ratio of 1.2) and heated to 850 °C were found to contain a mixture of NiSi and the theta- nickel silicide (hexagonal - Ni2Si) phase, while samples heated to a lower temperature (790 °C) result in predominantly NiSi. |
| Citation: |
Applied Physics Letters |
| Volume: |
95 |
| Issue: |
18 |
| Pages: |
3 pp. |
| Keywords: |
nanocalorimeter; nanocalorimetry; thin film; nickel; silicon; silicide; formation; thin film; reaction |
| Research Areas: |
Nanometrology, Thin-Films, Semiconductor Materials, Nanomaterials, Thermodynamics and kinetics |
| PDF version: |
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