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Publication Citation: Measurement of heat capacity and enthalpy of formation of Nickel Silicide using Nano-calorimetry

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Author(s): Ravi Kummamuru; Lito De La Rama; Liang Hu; Mark D. Vaudin; Mikhail Efremov; Martin L. Green; David A. LaVan; Leslie Allen;
Title: Measurement of heat capacity and enthalpy of formation of Nickel Silicide using Nano-calorimetry
Published: November 02, 2009
Abstract: We present characterization of energetics of the reaction between nickel and silicon thin films using differential scanning nano-calorimetry (nano-DSC). For the first time, nano-DSC measurements up to 850 °C and of enthalpy of thin film reactions have been performed. A large exothermic dip in heat capacity attributed to nickel silicide formation is found along with indications of two phase changes at 430 °C and 550 °C. Heating rate reaches 10^6 K/s during the reaction. The total enthalpy of reaction and heat capacity at various stages of the experiment were quantitatively measured. The post-reaction phases were identified using electron backscattered diffraction (EBSD). Samples with 17 nm Ni and 25 nm Si films deposited (Ni/Si molar ratio of 1.2) and heated to 850 °C were found to contain a mixture of NiSi and the theta- nickel silicide (hexagonal - Ni2Si) phase, while samples heated to a lower temperature (790 °C) result in predominantly NiSi.
Citation: Applied Physics Letters
Volume: 95
Issue: 18
Pages: 3 pp.
Keywords: nanocalorimeter; nanocalorimetry; thin film; nickel; silicon; silicide; formation; thin film; reaction
Research Areas: Nanometrology, Thin-Films, Semiconductor Materials, Nanomaterials, Thermodynamics and kinetics
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