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Publication Citation: Boron Incorporation With and Without Atomic Hydrogen During the Growth of Doped Layers on Si(100)

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Author(s): C Silvestre; P Thompson; G Jernigan; David S. Simons;
Title: Boron Incorporation With and Without Atomic Hydrogen During the Growth of Doped Layers on Si(100)
Published: July 01, 1998
Abstract:
Citation: Journal of Vacuum Science and Technology A
Volume: 16
Issue: 4
Pages: pp. 2619 - 2624
Research Areas: Chemistry