NIST Authors in Bold
| Author(s): | Xiaohong Gu; Mark R. VanLandingham; Michael J. Fasolka; Jonathan W. Martin; J Y. Jean; Tinh Nguyen; |
|---|---|
| Title: | Enhancing Sensitivity of Atomic Force Microscopy for Characterizing Surface Chemical Heterogeneity |
| Published: | February 26, 2003 |
| Abstract: | In this study, a well-controlled humidity system is used to enhance the sensitivity of A-FM in characterizing surface chemical heterogeneity. The relative humidity of the tip-sample environment is controlled using a humidity generator and a novel small-volume environmental chamber designed and fabricated. The relative humidity in the chamber can be controlled from nearly 0 % relative humidity (RH) up to 95 % RH at room temperature. The effects of relative humidity on AFM image contrast are studied using a patterned SAM sample and polymers withalternating regions of hydrophobic and hydrophilic materials. The results clearly demonstrate that the image contrast between the hydrophilic and hydrophobic regions of a surface is substantially increased by elevated relative humidity in the measurement environment. |
| Conference: | Adhesion Society Meeting |
| Proceedings: | Proceedings of the 26th Annual Meeting of the Adhesion Society |
| Pages: | pp. 185 - 187 |
| Dates: | February 23-26, 2003 |
| Keywords: | Atomic Force Microscopy (AFM);humidity;relative humidity (RH) |
| Research Areas: | |
| PDF version: | Click here to retrieve PDF version of paper (907KB) |