| Author(s): |
M Wang; Eric K. Lin; Alamgir Karim; Michael J. Fasolka; |
| Title: |
Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists |
| Published: |
January 01, 2003 |
| Abstract: |
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| Conference: |
Characterization and Metrology for ULSI Technology: 2003 International Conference |
| Location: |
Austin, TX |
| Keywords: |
Combinatorial and THE Methods;Lithography;Thin Films;chemically amplified resist;combinatorial method;thin film |
| Research Areas: |
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| PDF version: |
 Click here to retrieve PDF version of paper (1MB) |
