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Publication Citation: Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity

NIST Authors in Bold

Author(s): Charles E. Bouldin; William E. Wallace; G W. Lynn; S C. Roth; Wen-Li Wu;
Title: Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity
Published: January 01, 2000
Abstract:
Citation: Japanese Journal of Applied Physics
Volume: 88(2)
Keywords: electronic materials,reflectivity,silicon,thin films,thin-films
Research Areas: Polymers
PDF version: PDF Document Click here to retrieve PDF version of paper (85KB)