Publication Citation
NIST Authors in Bold
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| Author(s): | Charles E. Bouldin; William E. Wallace III; G W. Lynn; S C. Roth; Wen-Li Wu; |
|---|---|
| Title: | Thermal Expansion Coefficients of Low-K Dielectric Films From Fourier Analysis of X-Ray Reflectivity |
| Published: | January 01, 2000 |
| Abstract: | |
| Citation: | Japanese Journal of Applied Physics |
| Volume: | 88(2) |
| Keywords: | electronic materials;reflectivity;silicon;thin films;thin-films |
| Research Areas: | Polymers |
| PDF version: |  Click here to retrieve PDF version of paper (83KB) |