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Publication Citation: Robust Optical Design of Angled Multilayer Dielectric Mirrors Optimized for Rubidium Vapor Cell Return Reflection

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Author(s): M A. Perez; John E. Kitching; A Shkel;
Title: Robust Optical Design of Angled Multilayer Dielectric Mirrors Optimized for Rubidium Vapor Cell Return Reflection
Published: August 01, 2008
Abstract: This paper reports on the design and implementation of thin film multilayer dielectric reflectors on the sidewalls of micromachined reflector cells. Due to shadowing within the cavity, significant variations in the thicknesses of the thin films will be encountered when fabricated using PECVD. Such variations in deposition thickness cells may limit optical performance. An optimized design procedure is described to maximize the performance of the reflector under these variations. In addition, an optical design based on the superposition of multiple shifted quarter wave bragg reflectors is used to form a reflector with extended optical bandwidth. This extended reflectance range maintains high reflection at the D1 absorption wavelength of 87Rb over greater then 70% uniformity variation for use in miniature rubidium vapor cells for atomic MEMS applications.
Conference: Proc. 2008 Hilton Head Sensors and Actuators Conference
Proceedings: Proceedings of the Hilton Head Workshop 2008: A Solid-State Sensors, Actuators, and Microsystems Workshop
Pages: pp. 296 - 299
Location: Hilton Head, SC
Dates: June 1-5, 2008
Keywords: micromachining;alkali vapor cell;atomic clock;magnetometer;gyroscope
Research Areas: Physics, Atomic Physics
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