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NIST Authors in Bold
|Author(s):||Charles S. Tarrio; Steven E. Grantham; Robert E. Vest; Thomas B. Lucatorto;|
|Title:||At-Wavelength Metrology for EUV Lithography at NIST|
|Published:||July 14, 2009|
|Abstract:||The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror endurance testing.|
|Citation:||International Extreme Ultraviolet Lithography Symposium|
|Keywords:||endurance testing,environmental testing,extreme ultraviolet,lithography,radiometry,reflectometry|