NIST logo

Publication Citation: At-Wavelength Metrology for EUV Lithography at NIST

NIST Authors in Bold

Author(s): Charles S. Tarrio; Steven E. Grantham; Robert E. Vest; Thomas B. Lucatorto;
Title: At-Wavelength Metrology for EUV Lithography at NIST
Published: Date Unknown
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror endurance testing.
Citation: International Extreme Ultraviolet Lithography Symposium
Keywords: endurance testing;environmental testing;extreme ultraviolet;lithography;radiometry;reflectometry
Research Areas: