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Publication Citation: At-Wavelength Metrology for EUV Lithography at NIST

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Author(s): Charles S. Tarrio; Steven E. Grantham; Robert E. Vest; Thomas B. Lucatorto;
Title: At-Wavelength Metrology for EUV Lithography at NIST
Published: July 14, 2009
Abstract: The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our activities in the areas of reflectometry, pulsed radiometry, and long-term multiplayer mirror endurance testing.
Citation: International Extreme Ultraviolet Lithography Symposium
Keywords: endurance testing,environmental testing,extreme ultraviolet,lithography,radiometry,reflectometry
Research Areas: