| Author(s): |
L P. Ratliff; Ronaldo Minniti; A Bard; E W. Bell; John D. Gillaspy; D Parks; A J. Black; G M. Whitesides; |
| Title: |
Exposure of Self-Assembled Monolayers to Highly Charged Ions and Metastable Ions |
| Published: |
July 01, 1999 |
| Abstract: |
The doses of neutral metastable argon atoms (Ar*) and highly charged xenon ions (HCIs) required to damage self-assembled monolayers (SAMs) of alkanethiolates on gold are compared in a set of experiments carried out concurrently. The extent of damage to the SAM is determined by developing the samples in a gold etching solution, then measuring the decrease in reflectivity of the gold; {approximately} 105 Ar* are required to cause the same amount of damage as 1 HCI, as measured by this assay. We have also demonstrated HCI micropatterning of a surface using a physical mask, suggesting the application of this system in lithography. |
| Citation: |
Applied Physics Letters |
| Volume: |
75 |
| Issue: |
No. 4 |
| Keywords: |
dose;highly charged ions;metastable ions;patterning;self-assembled monolayers;surface |
| Research Areas: |
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