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NIST Authors in Bold
|Author(s):||Sasa Bajt; H N. Chapman; Nhan Nguyen; J Alameda; J C. Robinson; M Malinowski; E Gullikson; Andrew Aquila; Charles S. Tarrio; Steven E. Grantham;|
|Title:||Design and Performance of Capping Layers for EUV Multilayer Mirrors|
|Published:||June 01, 2003|
|Abstract:||The reflectance stability of multilayer coatings for extreme ultraviolet lithography (EUVL) in a commercial tool environment is of utmost importance to ensure continuous exposures with minimum maintenance cost. We have made substantial progress in designing the protective capping layer coatings, understanding their performance and estimating their lifetimes based on accelerated electron beam and EUV exposure studies. Our current capping layer coatings have about 40 times longer lifetimes than Si-capped multiplayer optics. Nevertheless, the lifetime of current Ru-capped multilayers is too short to satisfy commercial tool requirements and further improvements are essential.|
|Conference:||Proceedings of SPIE--the International Society for Optical Engineering|
|Proceedings:||Emerging Lithographic Technologies, Conference | 7th | Emerging Lithographic Technologies VII | SPIE|
|Dates:||February 1, 2003|
|Keywords:||capping layer,extreme ultraviolet (EUV) lithography,multilayers,optics,oxidation resistance,reflectivity,ruthenium|