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Publication Citation: Extreme Ultraviolet Metrology at SURF III

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Author(s): Charles S. Tarrio; Robert E. Vest; S Grantham; Thomas B. Lucatorto;
Title: Extreme Ultraviolet Metrology at SURF III
Published: January 01, 2001
Abstract: The last two decades have seen the development normal-incidence multiplayer mirrors and semiconductor photodiodes for extreme ultraviolet (EUV) radiation. Applications such as in astrophysics, lithography, and plasma physics, require precise calibrations of the associated instrumentation.
Citation: Synchrotron Radiation News
Volume: 14
Keywords: extreme ultraviolet;metrology;radiometry;reflectometry;source-based radiometry
Research Areas: