Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Albert J. Fahey; John G. Gillen; P Chi; Christine M. Mahoney;|
|Title:||Performance of a C60+ Ion Source on a Dynamic SIMS Instrument|
|Published:||July 01, 2006|
|Abstract:||An IonOptika  C60+ ion source has been fitted onto a CAMECA  ims-4f. Stable ion beams of C60+ and C602+ have been obtained with typical currents approaching 20 nA under conditions that allow for several days of source operation. The beam has been able to be focussed into a spot size of ~1 ?m and scanning ion images acquired. We have performed analyses to characterize the performance of C60+ and C602+. Depth profiles of a Cr-Ni multi-layer and polymer films with C60+ have produced excellent results. We have discovered that under bombardment energies of <12 kV on Si that C60+ will sputter material from the sample but will also produce deposition at a rate that exceeds the sputter rate. The performance of the source and our experiences with its operation will be discussed and some characteristic analysis data will be shown.|
|Citation:||Applied Surface Science|
|Keywords:||Buckministerfullerene,cluster ion beams,ion source,SIMS ion source|