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|Author(s):||Marlon L. Walker; Lee J. Richter; Daniel Josell; Thomas P. Moffat;|
|Title:||An In Situ Ellipsometric Study of Cl- -Induced Adsorption of PEG on Ru and on Underpotential Deposited Cu on Ru|
|Published:||January 01, 2006|
|Abstract:||The adsorption of PEG-Cl on a.) air-oxidized Ru, b.) reduced or activated Ru and c.) underpotential deposited (upd) Cu on activated Ru was examined in-situ using spectroscopic ellipsometry. In the absence of Cl- ion, PEG adsorption was minimal at all potentials and on all surfaces characterized in this study. On activated Ru, the addition of Cl- ion resulted in PEG coadsorption. At potentials relevant to Cu upd, a three-component PEG-Cl--Cu layer forms independent of the order of additive addition to the electrolyte. The PEG-Cl--Cu upd overlayer provides inhibition of subsequent Cu overpotential deposition. At potentials positive of Cu upd, a monolayer oxide film forms that inhibits PEG adsorption even in the presence of Cl-. Ru oxidation exerts a strong effect on the adsorption of additives that are directly relevant to the nucleation and growth of electrodeposited Cu.|
|Citation:||Journal of the Electrochemical Society|
|Keywords:||coadsorption under potential deposition,Cu electrodeposition,Cu upd,PEG-C1,Ru Barrier material,spectroscopic ellipsomety,superfilling|
|Research Areas:||Chemistry, Nanotechnology|
|PDF version:||Click here to retrieve PDF version of paper (131KB)|