| Author(s): |
Marlon L. Walker; Lee J. Richter; Daniel Josell; Thomas P. Moffat; |
| Title: |
An In Situ Ellipsometric Study of Cl- -Induced Adsorption of PEG on Ru and on Underpotential Deposited Cu on Ru |
| Published: |
January 01, 2006 |
| Abstract: |
The adsorption of PEG-Cl on a.) air-oxidized Ru, b.) reduced or activated Ru and c.) underpotential deposited (upd) Cu on activated Ru was examined in-situ using spectroscopic ellipsometry. In the absence of Cl- ion, PEG adsorption was minimal at all potentials and on all surfaces characterized in this study. On activated Ru, the addition of Cl- ion resulted in PEG coadsorption. At potentials relevant to Cu upd, a three-component PEG-Cl--Cu layer forms independent of the order of additive addition to the electrolyte. The PEG-Cl--Cu upd overlayer provides inhibition of subsequent Cu overpotential deposition. At potentials positive of Cu upd, a monolayer oxide film forms that inhibits PEG adsorption even in the presence of Cl-. Ru oxidation exerts a strong effect on the adsorption of additives that are directly relevant to the nucleation and growth of electrodeposited Cu. |
| Citation: |
Journal of the Electrochemical Society |
| Volume: |
153 |
| Issue: |
No. 4 |
| Keywords: |
coadsorption under potential deposition;Cu electrodeposition;Cu upd;PEG-C1;Ru Barrier material;spectroscopic ellipsomety;superfilling |
| Research Areas: |
Nanotechnology, Chemistry |
| PDF version: |
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