Silver, R.
and Vladar, A.
(2005),
Photomask Metrology, Photomask Fabrication Technology, McGraw-Hill Professional, New York, NY
(Accessed April 18, 2024)
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Photomask Metrology, Photomask Fabrication Technology
Published
Author(s)
,
Abstract
In this paper we will focus on the different metrology techniques used to measure features on photomasks. In view of the above discussion, we will focus on the importance of accurately measuring features and developing traceability. The metrology techniques broadly include measuring feature positions, feature dimensions, defect printability, optical phase shifts and those additional elements which contribute to the final image transferred into the resist. Also, evaluation of the dimensions and flatness of photomask blanks will be discussed.Citation
Photomask Metrology, Chapter in Photomask Fabrication Technology
Publisher Info
McGraw-Hill Professional, New York, NY
Pub Type
Books
Keywords
feature dimensions, feature positions, metrology, optical phase shifts, photomasks
Citation
Created January 1, 2005, Updated February 19, 2017