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NIST Authors in Bold
|Author(s):||J Allgair; C Archie; W Banke; H Bogardus; J Griffith; H Marchman; Michael T. Postek; L Saraf; J Schlesinger; B Singh; N. Sullivan; L Trimble; Andras Vladar; A Yanof;|
|Title:||Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology|
|Published:||June 01, 1998|
|Abstract:||The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope (CD-SEM) specification in the interests of providing a unified criterion of performance and testing. The specification is grounded on standard definitions and strong principles of metrology. The current revision is to be published as a SEMATECH document. A new revision, now in progress, will embody the consensus of a vendor/user conference.|
|Conference:||Metrology, Inspection, and Process Control for Microlithography XII, Bhanwar Singh, Editor|
|Proceedings:||Proceedings of SPIE|
|Pages:||pp. 138 - 150|
|Location:||Santa Clara, CA|
|Dates:||February 23, 1998|
|Keywords:||accuracy,charging,contamination,critical dimension,metrology,pattern recotnition,precision,scanning electron microscope,specification|
|Research Areas:||Metrology, Manufacturing|