NIST logo

Publication Citation: Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology

NIST Authors in Bold

Author(s): J Allgair; C Archie; W Banke; H Bogardus; J Griffith; H Marchman; Michael T. Postek; L Saraf; J Schlesinger; B Singh; N. Sullivan; L Trimble; Andras Vladar; A Yanof;
Title: Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology
Published: June 01, 1998
Abstract: The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope (CD-SEM) specification in the interests of providing a unified criterion of performance and testing. The specification is grounded on standard definitions and strong principles of metrology. The current revision is to be published as a SEMATECH document. A new revision, now in progress, will embody the consensus of a vendor/user conference.
Conference: Metrology, Inspection, and Process Control for Microlithography XII, Bhanwar Singh, Editor
Proceedings: Proceedings of SPIE
Volume: 3332
Pages: pp. 138 - 150
Location: Santa Clara, CA
Dates: February 23, 1998
Keywords: accuracy;charging;contamination;critical dimension;metrology;pattern recotnition;precision;scanning electron microscope;specification
Research Areas: Metrology, Manufacturing