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Publication Citation: Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications

NIST Authors in Bold

Author(s): James D. Gilsinn; Hui Zhou; Bradley N. Damazo; Joseph Fu; Richard M. Silver;
Title: Nano-Lithography in Ultra-High Vacuum (UHV) for Real World Applications
Published: March 11, 2004
Abstract: As nano-lithography technology improves, more companies and research groups have the capability to create nano-scale structures. Scanning tunneling microscopes (STMs) are commonly used to create these structures and evaluate them afterward. One difficulty is that these nanostructures are difficult to find on a centimeter-sized sample without very specialized hardware and post-processing. The National Institute of Standards and Technology (NIST) is conducting research into developing an integrated system consisting of a high-precision STM, course motion system, interferometer, and vision system that would allow these structures to be accurately created, recognized, and evaluated in ultra-high vacuum (UHV). The fast scan direction in this high-precision STM uses a piezo-driven flexure stage with an interferometer system that allows the motion to be tracked very accurately. A course motion system allows the sample to be moved in larger steps than the STM could move on its own. A vision system capable of locating micro-scaled structures on the sample is used to map larger features on the sample and aid the STM in writing and locating nano-scale features. By combining all these components into one integrated system, NIST hopes to develop the capability to combine nano-scale features with large-scale structures.
Conference: Nanotech 2004
Proceedings: Proceedings of Nanotech 2004
Location: Boston, MA
Dates: March 7-11, 2004
Keywords: etching,interferometer,microscopy,Miscellaneous,nano-lithography,STM
Research Areas:
PDF version: PDF Document Click here to retrieve PDF version of paper (249KB)