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Publication Citation: Calibration Strategies for Overlay and Registration Metrology

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Author(s): Richard M. Silver; Michael T. Stocker; Ravikiran Attota; M R. Bishop; Jay S. Jun; Egon Marx; M P. Davidson; Robert D. Larrabee;
Title: Calibration Strategies for Overlay and Registration Metrology
Published: May 01, 2003
Abstract: Critical dimensions in current and next generation devices are driving the need for tighter overlay registration tolerances and improved overlay metrology tool accuracy and repeatability. Tool matching, performance evaluation, model-based metrology, and a move towards closed-loop image placement control all increase the importance of improved accuracy and calibration methodology. The National Institute of Standards and Techology (NIST) is introducing a calibrated overlay wafer standard. A number of calibration requirements must be addressed when using this standard, including identification of the best methods for evaluating measurement bias and uncertainties, proper data acquistion and analysis, and the best calibration strategy.
Conference: Overlay and Registration Metrology I
Proceedings: Proceedings of SPIE Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor May 2003
Volume: 5038
Pages: pp. 103 - 120
Location: Santa Clara, CA
Dates: February 24, 2003
Keywords: accuracy,measurement uncertainty,overlay tool calibration,repeatability,tool matching,traceability
Research Areas: Metrology, Manufacturing