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|Author(s):||Michael T. Postek; Andras Vladar; J R. Lowney;|
|Title:||Models for Relating Scanning Electron Microscopy Images to Measured Artifacts|
|Published:||April 01, 1996|
|Abstract:||A specific example of a technique we developed to enhance the information obtained from SEM images is the extraction of an approximate profile corresponding to an electron beam with zero beam diameter from one with a finite beam diameter. Results were obtained for the simulated backscattered and secondary electron yields, respectively, from a 1 um step in a silicon substrate at 1 keV beam energy. Finer detail has been extracted from the original signal by this method, and allows for more information to be obtained about the target geometry.|
|Citation:||Proceedings of Scanning 96|
|Pages:||pp. 179 - 180|
|Research Areas:||Manufacturing, Metrology|