Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Hao Xiong; John S. Suehle;|
|Title:||Spatial Probing of Traps in nMOSFET with ALD HfO2/SiO2 Stacks Using Low Frequency Noise Characteristics|
|Published:||October 15, 2006|
|Abstract:||Low frequency (LF) noise is studied in nMOSFET with various HfO2 dielectric or interfacial layer (IL) thickness and TiN as gate electrode material. LF noise increases with HfO2 thickness, and decreases with IL SiO2 thickness. Traps at the channel and dielectric interface do not contribute to the LF noise or cannot be resolved from thermal noise. The LF noise correlates well with the hysteresis or Vth instability in DC measurement. Volume trap density calculated from LF noise analysis is more than one level of magnitude higher in 7 nm HfO2 than in 3 nm HfO2 devices. Qualitative trap spatial profile can be obtained from the LF spectra, and the stress induced redistribution of trap distribution is discussed.|
|Conference:||IEEE International Integrated Reliability Workshop|
|Proceedings:||IEEE International Integrated Reliability Workshop Final Report|
|Location:||Fallen Leaf, CA|
|Dates:||October 16-19, 2006|
|Keywords:||1/f noise,border trap,charge pumping,High-k gate dielectrics,metal gate,MOSFETs|