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| Author(s): | David G. Seiler; |
|---|---|
| Title: | Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics |
| Published: | November 01, 2006 |
| Abstract: | Since 1995, the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled "Characterization and Metrology for ULSI Technology") has provided a forum for the characterization and metrology community to meet and discuss important breakthroughs and challenges that directly and indirectly affect manufacturing. The methods and techniques have included all approaches: chemical and physical, electrical, optical, in-situ, and real-time control and monitoring. |
| Citation: | IEEE Transactions on Semiconductor Manufacturing |
| Pages: | pp. 371 - 371 |
| Keywords: | characterization;conference;metrology;nanoelectronics |
| Research Areas: | |
| PDF version: | Click here to retrieve PDF version of paper (141KB) |