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|Author(s):||David G. Seiler;|
|Title:||Special Section on the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics|
|Published:||November 01, 2006|
|Abstract:||Since 1995, the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled "Characterization and Metrology for ULSI Technology") has provided a forum for the characterization and metrology community to meet and discuss important breakthroughs and challenges that directly and indirectly affect manufacturing. The methods and techniques have included all approaches: chemical and physical, electrical, optical, in-situ, and real-time control and monitoring.|
|Citation:||IEEE Transactions on Semiconductor Manufacturing|
|Pages:||pp. 371 - 371|
|PDF version:||Click here to retrieve PDF version of paper (144KB)|