| Author(s): |
Qiliang Li; Sang-Mo Koo; Curt A. Richter; Monica D. Edelstein; John E. Bonevich; Joseph J. Kopanski; John S. Suehle; Eric M. Vogel; |
| Title: |
Precise Alignment of single Nanowires and Fabrication of Nanoelectromechanical Switch and Other Test Structures |
| Published: |
March 01, 2007 |
| Abstract: |
The integration of nanowires and nanotubes into electrical test structures to investigate their nanoelectronic transport properties is a significant challenge. Here we present a single nanowire manipulating system to precisely manipulate and align individual nanowires. We show that a single nanowire can be picked up and transferred to a pre-defined location by electrostatic force. Compatible fabrication processes have been developed to simultaneously pattern multiple aligned nanowires by using one-level of photolithography. In addition, we have fabricated and characterized representative devices and test structures including nanoelectromechanical switches with large on/off current ratios, bottom-gated silicon nanowire field-effect transistors, and both transfer-length-method and Kelvin test structures. |
| Citation: |
IEEE Transactions on Nanotechnology |
| Volume: |
6 |
| Issue: |
2 |
| Pages: |
pp. 256 - 262 |
| Keywords: |
contact resistance, nanoelectromechanical switch;Kelvin test structure;silicon nanowire;Transfer Length Method |
| Research Areas: |
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| PDF version: |
 Click here to retrieve PDF version of paper (2MB) |
