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|Author(s):||Qiliang Li; Sang-Mo Koo; Curt A. Richter; Monica D. Edelstein; John E. Bonevich; Joseph J. Kopanski; John S. Suehle; Eric M. Vogel;|
|Title:||Precise Alignment of single Nanowires and Fabrication of Nanoelectromechanical Switch and Other Test Structures|
|Published:||March 01, 2007|
|Abstract:||The integration of nanowires and nanotubes into electrical test structures to investigate their nanoelectronic transport properties is a significant challenge. Here we present a single nanowire manipulating system to precisely manipulate and align individual nanowires. We show that a single nanowire can be picked up and transferred to a pre-defined location by electrostatic force. Compatible fabrication processes have been developed to simultaneously pattern multiple aligned nanowires by using one-level of photolithography. In addition, we have fabricated and characterized representative devices and test structures including nanoelectromechanical switches with large on/off current ratios, bottom-gated silicon nanowire field-effect transistors, and both transfer-length-method and Kelvin test structures.|
|Citation:||IEEE Transactions on Nanotechnology|
|Pages:||pp. 256 - 262|
|Keywords:||contact resistance, nanoelectromechanical switch,Kelvin test structure,silicon nanowire,Transfer Length Method|
|PDF version:||Click here to retrieve PDF version of paper (2MB)|