A Novel Multilayer Circuit Process Using YBa2Cu3Ox/SrTiO3 Thin Films Patterned by Wet Etching and Ion Milling

H. Q. Li; Ronald H. Ono; Leila R. Vale; David A. Rudman; Sy-Hwang Liou

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PUBLICATIONS

A Novel Multilayer Circuit Process Using YBa₂Cu₃O_x/SrTiO₃ Thin Films Patterned by Wet Etching and Ion Milling

Published

October 1, 1996

Author(s)

H. Q. Li, Ronald H. Ono, Leila R. Vale, David A. Rudman, Sy-Hwang Liou

Citation

Applied Physics Letters

Volume

Issue

Pub Type

Journals

Sensors

Citation

Li, H. , Ono, R. , Vale, L. , Rudman, D. and Liou, S. (1996), A Novel Multilayer Circuit Process Using YBa2Cu3Ox/SrTiO3 Thin Films Patterned by Wet Etching and Ion Milling, Applied Physics Letters (Accessed April 24, 2024)

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Created September 30, 1996, Updated October 12, 2021

A Novel Multilayer Circuit Process Using YBa2Cu3Ox/SrTiO3 Thin Films Patterned by Wet Etching and Ion Milling

Author(s)

Citation

Additional citation formats

A Novel Multilayer Circuit Process Using YBa₂Cu₃O_x/SrTiO₃ Thin Films Patterned by Wet Etching and Ion Milling