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Publication Citation: Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

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Author(s): Joaquin (. Martinez; John A. Dagata; Curt A. Richter; Richard M. Silver;
Title: Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology
Published: March 07, 2004
Abstract: The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaion will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.
Conference: 2004 Nanotechnology Conference and Trade Show
Volume: 3
Pages: pp. 354 - 357
Location: Boston, MA
Dates: March 7-11, 2004
Keywords: gate dielectrics;molecular electronics;nanoelectronics;nanolithography;thin films
Research Areas:
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