Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

NIST Authors in Bold

Author(s): Joaquin (. Martinez; John A. Dagata; Curt A. Richter; Richard M. Silver;
Title: Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology
Published: March 07, 2004
Abstract: The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaion will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.
Conference: 2004 Nanotechnology Conference and Trade Show
Volume: 3
Pages: pp. 354 - 357
Location: Boston, MA
Dates: March 7-11, 2004
Keywords: gate dielectrics,molecular electronics,nanoelectronics,nanolithography,thin films
Research Areas:
PDF version: PDF Document Click here to retrieve PDF version of paper (496KB)