| Author(s): |
Joaquin (. Martinez; John A. Dagata; Curt A. Richter; Richard M. Silver; |
| Title: |
Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology |
| Published: |
March 07, 2004 |
| Abstract: |
The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentaion will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization. |
| Conference: |
2004 Nanotechnology Conference and Trade Show |
| Volume: |
3 |
| Pages: |
pp. 354 - 357 |
| Location: |
Boston, MA |
| Dates: |
March 7-11, 2004 |
| Keywords: |
gate dielectrics;molecular electronics;nanoelectronics;nanolithography;thin films |
| Research Areas: |
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| PDF version: |
 Click here to retrieve PDF version of paper (484KB) |
