NIST logo

Publication Citation: Fundamental Electron Interactions with Plasma Processing Gases

NIST Authors in Bold

Author(s): Loucas G. Christophorou; James K. Olthoff;
Title: Fundamental Electron Interactions with Plasma Processing Gases
Published: November 01, 2003
Abstract: This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with molecules of current interest in modern technology, especially the semiconductor industry.
Citation: Fundamental Electron Interactions with Plasma Processing Gases
Pages: 776 pp.
Keywords: BCl3,c-C4F8,C2F6,C3F8,CF4,CHF3,Cl2,electron impact,electron interactions,electron scattering
Research Areas: