| Author(s): |
Loucas G. Christophorou; James K. Olthoff; |
| Title: |
Fundamental Electron Interactions with Plasma Processing Gases |
| Published: |
November 01, 2003 |
| Abstract: |
This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. |
| Citation: |
Fundamental Electron Interactions with Plasma Processing Gases |
| Pages: |
776 pp. |
| Keywords: |
BCl3;c-C4F8;C2F6;C3F8;CF4;CHF3;Cl2;electron impact;electron interactions;electron scattering |
| Research Areas: |
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