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Publication Citation: Fundamental Electron Interactions with Plasma Processing Gases

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Author(s): Loucas G. Christophorou; James K. Olthoff;
Title: Fundamental Electron Interactions with Plasma Processing Gases
Published: November 01, 2003
Abstract: This volume deals with the basic knowledge and undestanding of fundamtal interactions of low energy electrons with molecules. It provides an up-to-date and comprehensive account of the fundamental interactions of low energy energy electrons with molecules of current interest in modern technology, especially the semiconductor industry.
Citation: Fundamental Electron Interactions with Plasma Processing Gases
Pages: 776 pp.
Keywords: BCl3;c-C4F8;C2F6;C3F8;CF4;CHF3;Cl2;electron impact;electron interactions;electron scattering
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