Stacked Nanoscale Josephson Junction Arrays for High-Performance Voltage Standards

Published

December 4, 2002

Author(s)

Samuel Benz, Paul Dresselhaus, Yonuk Chong, Charles J. Burroughs

Abstract

Superconducting Josephson voltage standard systems have replaced electrochemical cell (battery-like) artifact standards for voltage metrology because quantum-based systems produce precise and accurate voltages independent of any material parameters. The performance of such systems has improved over the years as a result of advances in microelectronic fabriction. A new generation of voltage standard systems has new capabilities, such as stable and programmable dc voltages, ac voltages and arbitrary waveform synthesis. However, the even better performance of these new systems can be achieved through the development of nanoscale fabrication techniques and sub-nanometer control of junction barrier thicknesses. We are developing densely packed Josephson junction arrays for advanced voltage standard systems because performance will dramatically improve with high-density series arrays of junctions when the junction spacing becomes less than 100 nm. We describe the present state of our programmable and arbitrary waveform synthesizer systems and we present our latest nanoscale fabrication results using MoSi₂ as a normal-metal junction barrier. Preliminary results suggest that we should be able to achieve a 40 nm junction spacing.

Proceedings Title

Proc., Nano and Microsystems Technology and Metrology Conference

Conference Dates

December 4-5, 2002

Conference Location

Redstone Arsenal, AL, US

Pub Type

Conferences

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Keywords

digital-analog conversion, frequency synthesizers, Josephson arrays, quantization, signal synthesis, superconductor-normal-superconductor devices, voltage standard

Citation

Benz, S. , Dresselhaus, P. , Chong, Y. and Burroughs, C. (2002), Stacked Nanoscale Josephson Junction Arrays for High-Performance Voltage Standards, Proc., Nano and Microsystems Technology and Metrology Conference, Redstone Arsenal, AL, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=30904 (Accessed April 19, 2024)