| Author(s): |
Santos D. Mayo; Joseph J. Kopanski; William F. Guthrie; |
| Title: |
Intermittent-Contact Scanning Capacitance Microscopy Imaging and Modeling for Overlay Metrology |
| Published: |
December 31, 1998 |
| Abstract: |
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| Proceedings: |
Proc., 1998 International Conference on Characterization and Metrology for ULSI Technology |
| Pages: |
pp. 567 - 572 |
| Location: |
Gaithersburg, MD |
| Dates: |
March 23-27, 1998 |
| Keywords: |
2 D modeling;overlay metrology;scanning capacitance microscopy;SCM;scanning probe microscopy;SPM;test pattern; |
| Research Areas: |
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