NIST Authors in Bold
| Author(s): | Loucas G. Christophorou; James K. Olthoff; |
|---|---|
| Title: | Electron Interactions with Plasma Processing Gases: An Update for CF4, CHF3, C2F6 and C3F8 |
| Published: | December 01, 1999 |
| Abstract: | An update of electron-collision cross sections and electron transport parameters is presented for CF4, CHF3, C2F6, and C3F8. |
| Citation: | Journal of Physical and Chemical Reference Data |
| Volume: | 28 |
| Issue: | 4 |
| Pages: | pp. 967 - 982 |
| Keywords: | ;CF4;C2F6;C3F8;CHF3;cross sections;electron-interactions;scattering;transport coefficients; |
| Research Areas: | Electronics & Telecommunications |
| PDF version: | Click here to retrieve PDF version of paper (8MB) |