NIST Authors in Bold
| Author(s): | Alain C. Diebold; M. Kump; Joseph J. Kopanski; David G. Seiler; |
|---|---|
| Title: | Characterization of Two-Dimensional Dopant Profiles: Status and Review |
| Published: | December 31, 1995 |
| Abstract: | |
| Proceedings: | Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors |
| Pages: | pp. 2.1 - 2.8 |
| Location: | Research Triangle Park, NC |
| Dates: | March 20-22, 1995 |
| Research Areas: |