NIST logo

Publication Citation: High Frequency Measurements of CoFeHfO Thin Films

NIST Authors in Bold

Author(s): Stephen E. Russek; Pavel Kabos; Thomas J. Silva; Fred B. Mancoff; D Wang; Z. T. Qian; J. M. Daughton;
Title: High Frequency Measurements of CoFeHfO Thin Films
Published: July 01, 2001
Abstract: High frequency measurements of the transverse susceptibility and damping constant of CoFeHfo thin films have been made over a frequency range of 0.1 GHz to 6 GHz as a function of film resistivity, thickness, and temperature. The films show relatively low high-frequency damping with the damping constant a ranging from 0.01 to 0.06. The damping constant increases with film resistivity and, for the highest resistivity films, the damping constant decreases as the thickness increases. The damping constant, induced anisotropy, and film resistivity show weak temperature dependence over a temperature range from 4 K to 300 K. The low damping constant, in conjunction with the high anisotropy and large spin-dependent tunneling magnetoresistance, makes this material attractive for high frequency magnetic device applications.
Citation: IEEE Transactions on Magnetics
Volume: 37
Issue: 4
Pages: pp. 2248 - 2250
Keywords: CoFeHfO;FMR;magnetic device dynamics;magneto-electronics;
Research Areas: Electromagnetics
PDF version: PDF Document Click here to retrieve PDF version of paper (65KB)