Russek, S.
, Kabos, P.
, Silva, T.
, Mancoff, F.
, Wang, D.
, Qian, Z.
and Daughton, J.
(2001),
High Frequency Measurements of CoFeHfO Thin Films, IEEE Transactions on Magnetics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=15471
(Accessed April 19, 2024)
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High Frequency Measurements of CoFeHfO Thin Films
Published
Author(s)
, , , , D Wang, Z. T. Qian, J. M. Daughton
Abstract
High frequency measurements of the transverse susceptibility and damping constant of CoFeHfo thin films have been made over a frequency range of 0.1 GHz to 6 GHz as a function of film resistivity, thickness, and temperature. The films show relatively low high-frequency damping with the damping constant a ranging from 0.01 to 0.06. The damping constant increases with film resistivity and, for the highest resistivity films, the damping constant decreases as the thickness increases. The damping constant, induced anisotropy, and film resistivity show weak temperature dependence over a temperature range from 4 K to 300 K. The low damping constant, in conjunction with the high anisotropy and large spin-dependent tunneling magnetoresistance, makes this material attractive for high frequency magnetic device applications.Citation
IEEE Transactions on Magnetics
Volume
37
Issue
4
Pub Type
Journals
Download Paper
Keywords
CoFeHfO, FMR, magnetic device dynamics, magneto-electronics
Citation
Created June 30, 2001, Updated October 12, 2021