Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
NIST Authors in Bold
|Author(s):||Joseph J. Kopanski; Santos D. Mayo;|
|Title:||Intermittent-Contact Scanning Capacitance Microscope for Lithographic Overlay Measurement|
|Published:||May 11, 1998|
|Abstract:||A new scanning capacitance microscope (SCM) mode was implemented by using an atomic force microscope (AFM) operated in intermittent contact and by measuring the tip-to-sample capacitance change at the tip vibration frequency. The intermittent-contact-mode SCM was able to image and determine the overlay separation of metal lines buried under an 1 [mu]m thick, planarized dielectric layer. Modeling of the intermittent-contact SCM signal across buried metal lines was consistent with the experimental results. This hybrid intermittent-contact AFM and SCM has the potential to measure the lithographic overlay between metal lines located at consecutive levels beneath dielectric layers in an integrated circuit.|
|Citation:||Applied Physics Letters|
|Pages:||pp. 2469 - 2471|
|Keywords:||atomic force microscopy,buried line imaging,overlay metrology|