| Author(s): |
Joseph J. Kopanski; Santos D. Mayo; |
| Title: |
Intermittent-Contact Scanning Capacitance Microscope for Lithographic Overlay Measurement |
| Published: |
May 11, 1998 |
| Abstract: |
A new scanning capacitance microscope (SCM) mode was implemented by using an atomic force microscope (AFM) operated in intermittent contact and by measuring the tip-to-sample capacitance change at the tip vibration frequency. The intermittent-contact-mode SCM was able to image and determine the overlay separation of metal lines buried under an 1 [mu]m thick, planarized dielectric layer. Modeling of the intermittent-contact SCM signal across buried metal lines was consistent with the experimental results. This hybrid intermittent-contact AFM and SCM has the potential to measure the lithographic overlay between metal lines located at consecutive levels beneath dielectric layers in an integrated circuit. |
| Citation: |
Applied Physics Letters |
| Volume: |
72 |
| Issue: |
19 |
| Pages: |
pp. 2469 - 2471 |
| Keywords: |
atomic force microscopy;buried line imaging;overlay metrology; |
| Research Areas: |
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