Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: High index optical materials for 193 nm immersion lithography

NIST Authors in Bold

Author(s): Simon G. Kaplan; J H. Burnett; Eric L. Shirley; D Horowitz; W Clauss; A Grenville; C Van peski;
Title: High index optical materials for 193 nm immersion lithography
Published: January 01, 2006
Abstract:
Citation: SPIE
Volume: 6154
Research Areas: