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Publication Citation: High index optical materials for 193 nm immersion lithography

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Author(s): Simon G. Kaplan; J H. Burnett; Eric L. Shirley; D Horowitz; W Clauss; A Grenville; C Van peski;
Title: High index optical materials for 193 nm immersion lithography
Published: January 01, 2006
Abstract:
Citation: SPIE
Volume: 6154
Research Areas: