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Publication Citation: Towards high accuracy reflectometry for extreme-ultraviolet lithography,

NIST Authors in Bold

Author(s): Charles S. Tarrio; Steven E. Grantham; M B. Squires; Robert E. Vest; Thomas B. Lucatorto;
Title: Towards high accuracy reflectometry for extreme-ultraviolet lithography,
Published: January 01, 2003
Abstract:
Citation: Journal of Research of the National Institute of Standards and Technology
Volume: 108
Research Areas: