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NIST Authors in Bold
|Author(s):||Zachary H. Levine; A R. Kalukin; M Kuhn; S P. Frigo; I McNulty; C C. Retsch; Ying-ju Wang; Uwe Arp; Thomas B. Lucatorto; B D. Ravel; Charles S. Tarrio;|
|Title:||Microtomography of an integrated circuit interconnect with an electromigration void|
|Published:||January 01, 2000|
|Citation:||Journal of Applied Physics|