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Publication Citation: Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology

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Author(s): Steven E. Grantham; Charles S. Tarrio; Thomas B. Lucatorto;
Title: Accurate reflectometry for Extreme Ultraviolet Lithography at the National Institute of Standards and Technology
Published: January 01, 2002
Abstract:
Citation: Journal of Vacuum Science and Technology
Volume: 20
Research Areas: