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Publication Citation: High-index materials for 193 nm immersion lithography

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Author(s): J H. Burnett; Simon G. Kaplan; Eric L. Shirley; P J. Tompkins; J E. Webb;
Title: High-index materials for 193 nm immersion lithography
Published: January 01, 2005
Abstract:
Citation: SPIE
Volume: 5754
Pages: pp. 611 - 621
Research Areas: