Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).

View the beta site
NIST logo

Publication Citation: High-index materials for 193 nm immersion lithography

NIST Authors in Bold

Author(s): J H. Burnett; Simon G. Kaplan; Eric L. Shirley; P J. Tompkins; J E. Webb;
Title: High-index materials for 193 nm immersion lithography
Published: January 01, 2005
Abstract:
Citation: SPIE
Volume: 5754
Pages: pp. 611 - 621
Research Areas: