Publication Citation
NIST Authors in Bold
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| Author(s): | B Budhlall; G Parris; P Zhang; X Gao; Z Zarkov; B Ross; Simon G. Kaplan; J Burnett; |
|---|---|
| Title: | High refractive index immersion fluids for 193 nm immersion lithography |
| Published: | January 01, 2005 |
| Abstract: | |
| Citation: | SPIE |
| Volume: | 5754 |
| Pages: | pp. 622 - 629 |
| Research Areas: |