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Publication Citation: High refractive index immersion fluids for 193 nm immersion lithography

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Author(s): B Budhlall; G Parris; P Zhang; X Gao; Z Zarkov; B Ross; Simon G. Kaplan; J Burnett;
Title: High refractive index immersion fluids for 193 nm immersion lithography
Published: January 01, 2005
Abstract:
Citation: SPIE
Volume: 5754
Pages: pp. 622 - 629
Research Areas: